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- W2945843371 abstract "This paper analyzes the relation between the boundary curvature radius of the drain region and the breakdown voltage of RF RESURF LDMOS.The bending of the curve in the RESURF technology can increase the breakdown voltage greatly.Analysis and simulation prove that the high breakdown voltage and much lower on-resistance in the same device profile can be maintained by an impurity dose or by increasing the thickness of the drift region and reducing boundary curvature radius of the drain region under the REUSRF principle." @default.
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- W2945843371 date "2006-10-12" @default.
- W2945843371 modified "2023-09-27" @default.
- W2945843371 title "Optimization of Breakdown Voltage and On-Resistance Based on the Analysisof the Boundary Curvature of the Drain Region in RF RESURF LDMOS" @default.
- W2945843371 hasPublicationYear "2006" @default.
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