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- W2946091570 abstract "This paper presents an analysis of impact of local bias temperature instability (BTI) by measuring Ring-Oscillators (RO) with short stage and its impact on Logic circuit and SRAM. The evaluation result of local BTI variation based on measuring RO at a test chip fabricated in 7 nm FinFET process shows that the standard deviation of NBTI Vth degradation is proportional to the square root of the mean value (μ(Δ Vthp)) at any stress time, Vth flavors and various recovery condition. Based on these measurement result, we present an analysis of its impact on logic circuit with considering measured Vth dependency on global NBTI. We also analyze its impact on SRAM minimum operation voltage (V <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>min</sub> ) of static noise margin (SNM) and shows nonnegligible V <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>min</sub> degradation due to local NBTI." @default.
- W2946091570 created "2019-05-29" @default.
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- W2946091570 date "2019-03-01" @default.
- W2946091570 modified "2023-10-13" @default.
- W2946091570 title "Study of Local BTI Variation and its Impact on Logic Circuit and SRAM in 7 nm Fin-FET Process" @default.
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- W2946091570 doi "https://doi.org/10.1109/irps.2019.8720508" @default.
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