FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W2947752463> ?p ?o ?g. }

• W2947752463 endingPage "137334" @default.
• W2947752463 startingPage "137334" @default.
• W2947752463 abstract "Abstract Nanocrystalline MBCN (M = Ti, Zr, Hf) films were deposited onto Si substrates using pulsed magnetron co-sputtering of a single B4C-M target (at a fixed 45% fraction of M in the target erosion area) with a repetition frequency of 10 kHz, voltage pulse duration of 85 μs and a fixed target power. The substrate temperature was adjusted to 450 °C during the depositions on the substrates at a floating potential. The total pressure of 95% Ar + 5% N2 gas mixture was 0.5 Pa for TiBCN and ZrBCN, but it had to be increased up to 1.7 Pa for HfBCN to decrease very high compressive stress in the films resulting in their delamination from the substrate. Energy-resolved mass spectroscopy was used to correlate the energy of Ar+ ions bombarding the growing films with high positive voltage overshoots after the negative voltage pulses. Monte-Carlo simulations were carried out to estimate the energy and flux of sputtered M atoms and backscattered Ar atoms at the substrate. It was found that the energy and flux of the backscattered Ar atoms increase significantly with the mass of the M atoms in the target. The MBCN films with 41–46 at.% of M, 25–31 at.% of B, 7–10 at.% of C and 14–22 at.% of N exhibit a high hardness (18–37 GPa), high elastic recovery (69–85%), high H/E⁎ ratio (0.10–0.14) and low electrical resistivity (1.7–2.7 μΩm) at a low internal stress (less than 0.8 GPa)." @default.
• W2947752463 created "2019-06-07" @default.
• W2947752463 creator A5006949461 @default.
• W2947752463 creator A5022745565 @default.
• W2947752463 creator A5045979796 @default.
• W2947752463 creator A5062505320 @default.
• W2947752463 creator A5083808085 @default.
• W2947752463 date "2019-10-01" @default.
• W2947752463 modified "2023-09-23" @default.
• W2947752463 title "Effect of energetic particles on pulsed magnetron sputtering of hard nanocrystalline MBCN (M = Ti, Zr, Hf) films with high electrical conductivity" @default.
• W2947752463 cites W1613484687 @default.
• W2947752463 cites W1971936954 @default.
• W2947752463 cites W1972216103 @default.
• W2947752463 cites W1973240939 @default.
• W2947752463 cites W1979963773 @default.
• W2947752463 cites W1981966175 @default.
• W2947752463 cites W1989832590 @default.
• W2947752463 cites W2003188167 @default.
• W2947752463 cites W2007848992 @default.
• W2947752463 cites W2009569409 @default.
• W2947752463 cites W2018855371 @default.
• W2947752463 cites W2025342299 @default.
• W2947752463 cites W2027183061 @default.
• W2947752463 cites W2038026626 @default.
• W2947752463 cites W2038128402 @default.
• W2947752463 cites W2047615267 @default.
• W2947752463 cites W2051846617 @default.
• W2947752463 cites W2052454532 @default.
• W2947752463 cites W2056552727 @default.
• W2947752463 cites W2063410516 @default.
• W2947752463 cites W2064258617 @default.
• W2947752463 cites W2069840314 @default.
• W2947752463 cites W2082320979 @default.
• W2947752463 cites W2086869398 @default.
• W2947752463 cites W2088900217 @default.
• W2947752463 cites W2092829029 @default.
• W2947752463 cites W2095411085 @default.
• W2947752463 cites W2096277584 @default.
• W2947752463 cites W2161060870 @default.
• W2947752463 cites W4230317933 @default.
• W2947752463 doi "https://doi.org/10.1016/j.tsf.2019.05.053" @default.
• W2947752463 hasPublicationYear "2019" @default.
• W2947752463 type Work @default.
• W2947752463 sameAs 2947752463 @default.
• W2947752463 citedByCount "7" @default.
• W2947752463 countsByYear W29477524632020 @default.
• W2947752463 countsByYear W29477524632021 @default.
• W2947752463 countsByYear W29477524632022 @default.
• W2947752463 countsByYear W29477524632023 @default.
• W2947752463 crossrefType "journal-article" @default.
• W2947752463 hasAuthorship W2947752463A5006949461 @default.
• W2947752463 hasAuthorship W2947752463A5022745565 @default.
• W2947752463 hasAuthorship W2947752463A5045979796 @default.
• W2947752463 hasAuthorship W2947752463A5062505320 @default.
• W2947752463 hasAuthorship W2947752463A5083808085 @default.
• W2947752463 hasConcept C121332964 @default.
• W2947752463 hasConcept C123408415 @default.
• W2947752463 hasConcept C131540310 @default.
• W2947752463 hasConcept C140676511 @default.
• W2947752463 hasConcept C147789679 @default.
• W2947752463 hasConcept C171250308 @default.
• W2947752463 hasConcept C185592680 @default.
• W2947752463 hasConcept C19067145 @default.
• W2947752463 hasConcept C191897082 @default.
• W2947752463 hasConcept C192562407 @default.
• W2947752463 hasConcept C22423302 @default.
• W2947752463 hasConcept C61427134 @default.
• W2947752463 hasConcept C62520636 @default.
• W2947752463 hasConcept C69990965 @default.
• W2947752463 hasConcept C97892325 @default.
• W2947752463 hasConceptScore W2947752463C121332964 @default.
• W2947752463 hasConceptScore W2947752463C123408415 @default.
• W2947752463 hasConceptScore W2947752463C131540310 @default.
• W2947752463 hasConceptScore W2947752463C140676511 @default.
• W2947752463 hasConceptScore W2947752463C147789679 @default.
• W2947752463 hasConceptScore W2947752463C171250308 @default.
• W2947752463 hasConceptScore W2947752463C185592680 @default.
• W2947752463 hasConceptScore W2947752463C19067145 @default.
• W2947752463 hasConceptScore W2947752463C191897082 @default.
• W2947752463 hasConceptScore W2947752463C192562407 @default.
• W2947752463 hasConceptScore W2947752463C22423302 @default.
• W2947752463 hasConceptScore W2947752463C61427134 @default.
• W2947752463 hasConceptScore W2947752463C62520636 @default.
• W2947752463 hasConceptScore W2947752463C69990965 @default.
• W2947752463 hasConceptScore W2947752463C97892325 @default.
• W2947752463 hasFunder F4320321006 @default.
• W2947752463 hasLocation W29477524631 @default.
• W2947752463 hasOpenAccess W2947752463 @default.
• W2947752463 hasPrimaryLocation W29477524631 @default.
• W2947752463 hasRelatedWork W1968373997 @default.
• W2947752463 hasRelatedWork W2001415651 @default.
• W2947752463 hasRelatedWork W2058096786 @default.
• W2947752463 hasRelatedWork W2079013579 @default.
• W2947752463 hasRelatedWork W2255166385 @default.
• W2947752463 hasRelatedWork W2353729944 @default.
• W2947752463 hasRelatedWork W2356622808 @default.
• W2947752463 hasRelatedWork W2367979151 @default.
• W2947752463 hasRelatedWork W2387657166 @default.

• next