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- W2948860156 abstract "CMOS-compatible SiN layers with ultra-low roughness were deposited using plasma beam assisted reactive sputtering. Material losses below 0.1 dB/cm making it a promising deposition method for photonic integrated circuits and multilayer coatings." @default.
- W2948860156 created "2019-06-14" @default.
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- W2948860156 date "2019-01-01" @default.
- W2948860156 modified "2023-09-25" @default.
- W2948860156 title "Low loss, plasma beam assisted reactive magnetron sputtered silicon nitride films for optical applications" @default.
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- W2948860156 doi "https://doi.org/10.1364/oic.2019.wb.4" @default.
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