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- W2950267744 abstract "Die chemischen und elektrischen Eigenschaften von dunnen SiO2-Filmen (500 bis 1000 A), die unter Zusatz kleiner HCl- oder C12-Anteile zur O2-haltigen Atmosphare im Temperaturbereich von 900-1150°C gewachsen sind, werden untersucht." @default.
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- W2950267744 date "1975-05-20" @default.
- W2950267744 modified "2023-09-25" @default.
- W2950267744 title "ChemInform Abstract: PROPERTIES OF SIO2 GROWN IN THE PRESENCE OF HCL OR CL2" @default.
- W2950267744 cites W1610415505 @default.
- W2950267744 doi "https://doi.org/10.1002/chin.197520012" @default.
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