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- W2950470257 abstract "Es wird eine optimierte isotrope Ätzllösung (36 Teile 49proz. HF, 20 Eisessig und I -2 7()proz. HNOg) zur Sichtbarmachung von Defekten in polykristtillinem Si vorgestellt." @default.
- W2950470257 created "2019-06-27" @default.
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- W2950470257 date "1984-07-17" @default.
- W2950470257 modified "2023-09-25" @default.
- W2950470257 title "ChemInform Abstract: A NEW DEFECT ETCH FOR POLYCRYSTALLINE SILICON" @default.
- W2950470257 cites W2121598961 @default.
- W2950470257 doi "https://doi.org/10.1002/chin.198429008" @default.
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