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• W2950744549 abstract "Abstract Microstructure, crystallization behavior, magnetic properties as well as nanoindentation mapping of mechanical properties were studied for amorphous and partially crystallized Fe72Co6Si4B9Mo1P8 alloy. X-ray diffraction accompanied by transmission electron microscopy studies confirm amorphicity of the as-quenched precursor, and complex nature of the material annealed at 873 K for 0.5 h. The primary at Tx1 = 766 K and secondary at Tx2 = 880 K crystallization temperatures were derived from DSC curve. Moreover, Curie points of 646 K and 1032 K for amorphous and crystalline phase created during heat treatment process, respectively, were also determined. Investigations of the magnetization versus temperature in zero field cooled mode allowed to determine Curie points for the amorphous and partially crystallized Fe72Co6Si4B9Mo1P8 alloy, as well as magnetic behavior of the investigated samples. Single phased and dual phased structures described by different mechanical properties for amorphous and annealed samples were confirmed by distribution maps of mechanical parameters. The as-quenched material is characterized by hardness of HVIT= (1050.31 ± 41.63) Vickers, elastic modulus of EIT= (107 ± 5) GPa and elastic deformation energy to total energy ratio of nIT= (46.68 ± 1.06) %. After annealing at 873 K bimodal distributions of mechanical parameters were observed. Evolution of hardness and elastic modulus as a function of penetration depth shows that with increasing of load both HVIT and EIT decrease. Moreover, elastic modulus for the amorphous and partially crystallized sample calculated for maximum load of 250 mN are almost the same." @default.
• W2950744549 created "2019-06-27" @default.
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• W2950744549 date "2019-09-01" @default.
• W2950744549 modified "2023-10-01" @default.
• W2950744549 title "Microstructure to magnetic properties and nanoindentation mapping of mechanical properties relationship in amorphous and partially crystallized Fe–Si–B–P-type alloy" @default.
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• W2950744549 doi "https://doi.org/10.1016/j.jallcom.2019.06.065" @default.
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