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- W2950826896 abstract "ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTSurface Chemistry in the Chemical Vapor Deposition of Electronic MaterialsStephen M. GatesView Author Information IBM T. J. Watson Research Center, Yorktown Heights, New York, 10598Cite this: Chem. Rev. 1996, 96, 4, 1519–1532Publication Date (Web):June 20, 1996Publication History Received1 September 1995Revised15 December 1996Published online20 June 1996Published inissue 1 January 1996https://doi.org/10.1021/cr950233mCopyright © 1996 American Chemical SocietyRIGHTS & PERMISSIONSArticle Views1624Altmetric-Citations73LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InReddit Read OnlinePDF (264 KB) Get e-AlertsSUBJECTS:Chemical vapor deposition,Deposition,Epitaxy,Precursors,Thin films Get e-Alerts" @default.
- W2950826896 created "2019-06-27" @default.
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- W2950826896 date "1996-01-01" @default.
- W2950826896 modified "2023-10-09" @default.
- W2950826896 title "Surface Chemistry in the Chemical Vapor Deposition of Electronic Materials" @default.
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