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W2950967587 abstract "High power impulse magnetron sputtering (HiPIMS) is an emerging thin film deposition technology that provides a highly ionized flux of sputtered species. This makes HiPIMS attractive for metal fill ..." @default.
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W2950967587 date "2019-07-08" @default.
W2950967587 modified "2023-09-30" @default.
W2950967587 title "Metal filling by high power impulse magnetron sputtering" @default.
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