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- W2952026432 abstract "A literature review of plating of copper into through‐holes and blind holes is provided. Emphasis is given to the scientific understanding of various phenomena associated with the processes being discussed. The topics include challenges posed to the plating processes, current state as well as the advantages and disadvantages of electroless and electroplated copper, copper distribution problems in electroplating of through‐holes, and mass transport deficiency in plating vias and masked patterns. Criteria for quantitative evaluation of limitations of plating technology are discussed on the basis of published literature." @default.
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- W2952026432 date "1989-05-09" @default.
- W2952026432 modified "2023-09-26" @default.
- W2952026432 title "ChemInform Abstract: Plating of Copper into Through-Holes and Vias" @default.
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- W2952026432 doi "https://doi.org/10.1002/chin.198919357" @default.
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