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• W2952053618 abstract "A method is described for the conversion of chemically deposited thin films of SnS on glass substrates to SnO2. The method involves heating in air for 1 h at 400~ The SnS films have a thickness of -0.7 jim and appear black in reflected daylight but deep red in transmission. They are prepared by chemical deposition from homogeneous solutions for a period of 7 h 30 rain at 60~ Their conversion to SnO2 is established by measurement of the optical transmittance and the x-ray diffraction patterns. Both the SnS and SnO2 films display photoconductive properties. The dark and photoconductivities of the latter can be increased by ~104 (to ~1 ~2 -~ cm -~) by vacuum annealing at 200~ for 1 h subsequent to thermal decomposition in the air. The increased photoconductivity is attributed to oxygen desorption from the grain boundaries and a non-stoichiometry brought about during the vacuum annealing. This explanation is offered because subequent air-annealing at 200~ is accompanied by a decrease in the conductivity. Tin oxide (SnO2) films in undoped form are semiconductors with a wide bandgap (Eg), 3.5-4 eV, 1-3 and a refractive index of approximately 1.92 Fluorine-, chlorine-, or antimony doped SnO2 films are quite stable toward atmospheric exposure and they have found numerous applications in commercial products. 4 They possess a sheet resistance of -10 to 100 ~2/[~, and high transmittance in the visible region, >80%, and they are reasonably hard. Such film~ have found use as transparent electrodes in electroluminescent, liquid crystal, and image intensifier panels and in photovoltaic and electrochromic devices. Also, they can function as heat mirrors in architectural, automobile, and photothermal solar collector glazings and in special furnaces and electric lamps. In the case of SnO=-Ag-SnO2 low emissivity coatings, the SnQ films function as antireflection coatings in the visible region. 4 Various techniques developed for the deposition of these films include chemical vapor deposition (CVD), 6 spray pyrolytic process, 7,8 reactive evaporation, 9 and reactive sputtering. 1~ This paper reports a method for the preparation of photoconductive SnO2 films by a two-step process: (i) deposition of a thin film of SnS from a chemical bath 'I and (if) conversion of these films to SnO2 by annealing in air at 400~ The chemical deposition technique described allows for the deposition of the SnS films inside or outside cylindrical glass surfaces and of the SnO2 films as well. This advantage is normally available only with the CVD technique. The high sheet resistance of -104 to 108 ~/[~ of the SnO2 films obtained in this manner does net allow for their use as transparent conductive films. However, this does not limit their application as optical coatings with good environmental stability." @default.
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• W2952053618 date "2010-08-20" @default.
• W2952053618 modified "2023-09-26" @default.
• W2952053618 title "ChemInform Abstract: Photoconductive SnO2 Thin Films from Thermal Decomposition of Chemically Deposited SnS Thin Films." @default.
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• W2952053618 doi "https://doi.org/10.1002/chin.199322297" @default.
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