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- W2952568064 abstract "Einflüsse der Festkörper-Rekristallisation auf die elektronischen Eigenschaften von Si-Filmen auf Saphir (SOS-Filme) nach der lmplantation von KSi-Ionen (l bis 8- I0 Si: Wem: bei 380 keV) und nachfolgender Temperung bei 600°C (4 h) wurden untersucht." @default.
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- W2952568064 date "1984-07-10" @default.
- W2952568064 modified "2023-10-18" @default.
- W2952568064 title "ChemInform Abstract: THE CHARACTERIZATION OF HETEROEPITAXIAL SILICON BY SURFACE PHOTOVOLTAGE TECHNIQUE. IMPROVED PROPERTIES IN SOS FILMS RESULTING FROM IMPLANT DAMAGE AND SOLID-STATE REGROWTH" @default.
- W2952568064 cites W1553414100 @default.
- W2952568064 doi "https://doi.org/10.1002/chin.198428017" @default.
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