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- W2953354857 abstract "The formation process of Ta 2 O 5 films in MOCVD using pentamethoxy tantalum (PMT) as a metal organic source and O 2 as reactant gas has been analyzed by in situ ellipsometry at deposition temperatures of 473-773 K. According to the change in the growth rate of the films, the formation process can be divided into three stages, the initial, the transition, and the final stages. The growth rate and the optical constant of the films were found to depend on the deposition temperature and the deposition time. All the films obtained at temperatures of 473-773 K had amorphous structures" @default.
- W2953354857 created "2019-06-27" @default.
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- W2953354857 date "2010-08-21" @default.
- W2953354857 modified "2023-09-27" @default.
- W2953354857 title "ChemInform Abstract: Ellipsometric Examination of Growth and Dissolution Rates of Ta2O5 Films Formed by Metalorganic Chemical Vapor Deposition." @default.
- W2953354857 cites W2093268854 @default.
- W2953354857 doi "https://doi.org/10.1002/chin.199243275" @default.
- W2953354857 hasPublicationYear "2010" @default.
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