FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W2955686903> ?p ?o ?g. }

• W2955686903 endingPage "012051" @default.
• W2955686903 startingPage "012051" @default.
• W2955686903 abstract "Bi-metal targets of ZnSn and SiAl were sputtered in A+O2+N2 gas mixtures at various N2/O2 ratios, and the deposited films were investigated by AFM and XPS. No nitrogen was detected in the films even at the highest nitrogen partial pressure in the gas, and the films were oxides. The concentration of the doping metal component in the deposited film increases with the increase of nitrogen partial pressure in the working gas. These experimental observations were supported by numerical calculations of the sputter-deposition process using a SRIM/SIMTRA+RSD software. It was shown that added nitrogen promotes sputtering of doping metal components of the targets, and the concentration of oxygen remains high enough to substitute the less active nitrogen in the growing film. The films consisted of nanograins with the average diameter, which decreased from 18 nm to 3 nm with increase of nitrogen content in the working gas. This effect was explained by the mechanism of abnormal grain growth: the film consisted of grains of oxides of two metals with different concentrations. The doping metal forms very fine nanograins of oxides, which suppress the growth of oxides of the main metal. With increase of nitrogen in the working gas mixture, the sputtering rate of doping metals from the cathodes and their respective concentration in the growing films increases, so the average diameter of oxide grains forming the coating decreases." @default.
• W2955686903 created "2019-07-12" @default.
• W2955686903 creator A5007963709 @default.
• W2955686903 creator A5066415337 @default.
• W2955686903 creator A5067487606 @default.
• W2955686903 creator A5086255264 @default.
• W2955686903 date "2019-06-01" @default.
• W2955686903 modified "2023-09-27" @default.
• W2955686903 title "Formation of nanoscale structures in thin films deposited by reactive magnetron sputtering of binary metal targets in Ar+O2+N2 gas mixture" @default.
• W2955686903 cites W1948587030 @default.
• W2955686903 cites W1966272089 @default.
• W2955686903 cites W2042896787 @default.
• W2955686903 cites W2043210936 @default.
• W2955686903 cites W2052695353 @default.
• W2955686903 cites W2066669605 @default.
• W2955686903 cites W2087804049 @default.
• W2955686903 cites W2159771125 @default.
• W2955686903 cites W2252483657 @default.
• W2955686903 cites W2256510359 @default.
• W2955686903 cites W2341559621 @default.
• W2955686903 cites W2399485414 @default.
• W2955686903 cites W2523152058 @default.
• W2955686903 cites W2534577615 @default.
• W2955686903 cites W2550388425 @default.
• W2955686903 cites W2733358909 @default.
• W2955686903 cites W2762112376 @default.
• W2955686903 doi "https://doi.org/10.1088/1742-6596/1238/1/012051" @default.
• W2955686903 hasPublicationYear "2019" @default.
• W2955686903 type Work @default.
• W2955686903 sameAs 2955686903 @default.
• W2955686903 citedByCount "0" @default.
• W2955686903 crossrefType "journal-article" @default.
• W2955686903 hasAuthorship W2955686903A5007963709 @default.
• W2955686903 hasAuthorship W2955686903A5066415337 @default.
• W2955686903 hasAuthorship W2955686903A5067487606 @default.
• W2955686903 hasAuthorship W2955686903A5086255264 @default.
• W2955686903 hasBestOaLocation W29556869031 @default.
• W2955686903 hasConcept C113196181 @default.
• W2955686903 hasConcept C127413603 @default.
• W2955686903 hasConcept C151730666 @default.
• W2955686903 hasConcept C171250308 @default.
• W2955686903 hasConcept C175708663 @default.
• W2955686903 hasConcept C178790620 @default.
• W2955686903 hasConcept C185592680 @default.
• W2955686903 hasConcept C19067145 @default.
• W2955686903 hasConcept C191897082 @default.
• W2955686903 hasConcept C192191005 @default.
• W2955686903 hasConcept C192562407 @default.
• W2955686903 hasConcept C22423302 @default.
• W2955686903 hasConcept C2779851234 @default.
• W2955686903 hasConcept C2816523 @default.
• W2955686903 hasConcept C42360764 @default.
• W2955686903 hasConcept C43617362 @default.
• W2955686903 hasConcept C49040817 @default.
• W2955686903 hasConcept C537208039 @default.
• W2955686903 hasConcept C540031477 @default.
• W2955686903 hasConcept C544153396 @default.
• W2955686903 hasConcept C57863236 @default.
• W2955686903 hasConcept C61427134 @default.
• W2955686903 hasConcept C64297162 @default.
• W2955686903 hasConcept C68463220 @default.
• W2955686903 hasConcept C86803240 @default.
• W2955686903 hasConceptScore W2955686903C113196181 @default.
• W2955686903 hasConceptScore W2955686903C127413603 @default.
• W2955686903 hasConceptScore W2955686903C151730666 @default.
• W2955686903 hasConceptScore W2955686903C171250308 @default.
• W2955686903 hasConceptScore W2955686903C175708663 @default.
• W2955686903 hasConceptScore W2955686903C178790620 @default.
• W2955686903 hasConceptScore W2955686903C185592680 @default.
• W2955686903 hasConceptScore W2955686903C19067145 @default.
• W2955686903 hasConceptScore W2955686903C191897082 @default.
• W2955686903 hasConceptScore W2955686903C192191005 @default.
• W2955686903 hasConceptScore W2955686903C192562407 @default.
• W2955686903 hasConceptScore W2955686903C22423302 @default.
• W2955686903 hasConceptScore W2955686903C2779851234 @default.
• W2955686903 hasConceptScore W2955686903C2816523 @default.
• W2955686903 hasConceptScore W2955686903C42360764 @default.
• W2955686903 hasConceptScore W2955686903C43617362 @default.
• W2955686903 hasConceptScore W2955686903C49040817 @default.
• W2955686903 hasConceptScore W2955686903C537208039 @default.
• W2955686903 hasConceptScore W2955686903C540031477 @default.
• W2955686903 hasConceptScore W2955686903C544153396 @default.
• W2955686903 hasConceptScore W2955686903C57863236 @default.
• W2955686903 hasConceptScore W2955686903C61427134 @default.
• W2955686903 hasConceptScore W2955686903C64297162 @default.
• W2955686903 hasConceptScore W2955686903C68463220 @default.
• W2955686903 hasConceptScore W2955686903C86803240 @default.
• W2955686903 hasLocation W29556869031 @default.
• W2955686903 hasOpenAccess W2955686903 @default.
• W2955686903 hasPrimaryLocation W29556869031 @default.
• W2955686903 hasRelatedWork W1994271692 @default.
• W2955686903 hasRelatedWork W2022760403 @default.
• W2955686903 hasRelatedWork W2029962027 @default.
• W2955686903 hasRelatedWork W2041748642 @default.
• W2955686903 hasRelatedWork W2052710927 @default.
• W2955686903 hasRelatedWork W2077106834 @default.
• W2955686903 hasRelatedWork W2268847765 @default.
• W2955686903 hasRelatedWork W2366815809 @default.

• next