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- W2955742005 abstract "Abstract An improved joining technique by reaction bonded technology was studied. The final densification and joining of the reaction-sintered composites were simultaneously completed in the reaction bonding process by one-step Si infiltration process. This method achieves joints with strong interfacial bonding and high flexural strength. The joint obtained by the one-step silicon infiltration reaction has a more uniform microstructure, the joint flexural strength is increased to 203 MPa, and retention rate of the flexural strength is 96%, which is comparable to the flexural strength of the C f /SiC substrate. The microstructure and interfacial evolution mechanism of the interlayer were discussed. The results show that a transition layer of 2–3 μm transition layer formed between the interlayer and the C f /SiC substrate, which is composed of SiC crystal grains of about 0.5–1 μm. The formation of the transition layer is due to the carbon concentration difference at the interface between interlayer and substrate, resulting in the diffusion of carbon during the Si C reaction." @default.
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- W2955742005 date "2019-09-01" @default.
- W2955742005 modified "2023-09-24" @default.
- W2955742005 title "Joining of the Cf/SiC composites by a one-step Si infiltration reaction bonding" @default.
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- W2955742005 doi "https://doi.org/10.1016/j.matchar.2019.109799" @default.
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