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- W2959025099 abstract "We propose an electrical evaluation technique named differential charge pumping (Δ-CP) to extract information on the interface states (D <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>it</sub> ) at the SiC/SiO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> interface. This technique allows to obtain information on (1) the physical location of the D <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>it</sub> ; (2) the energetic spread of the D <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>it</sub> in the bandgap; (3) if the D <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>it</sub> are donor or acceptor type. First results indicate contributions from both the “S/D” region and the channel regions to the overall CP signal. Surprisingly a substantial contribution of the “S/D” regions of the transistors to the overall CP signal is observed. In the channel region, both donors and acceptor type states are identified, the majority being acceptor type." @default.
- W2959025099 created "2019-07-23" @default.
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- W2959025099 date "2019-05-01" @default.
- W2959025099 modified "2023-09-27" @default.
- W2959025099 title "Differential Variable Base Charge Pumping ($Delta-text{CP}$) for SiO2/SiC Interface Characterization" @default.
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- W2959025099 doi "https://doi.org/10.1109/ispsd.2019.8757560" @default.
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