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- W2960558645 abstract "AbstractThe present paper focuses on proposing a new method for determining the surface roughness of chemically etched polishing of Si (100) using double disk magnetic abrasive finishing (DDMAF). B..." @default.
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- W2960558645 date "2019-07-09" @default.
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- W2960558645 title "Surface roughness modeling in chemically etched polishing of Si (100) using double disk magnetic abrasive finishing" @default.
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- W2960558645 doi "https://doi.org/10.1080/10910344.2019.1636261" @default.
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