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• W2964408090 abstract "This work presents the electro-thermal analysis of crosstalk effects in pristine (undoped) and intercalation doped multilayer graphene nanoribbon interconnects (MLGNRs). A temperature dependent distributed T-network model of MLGNR interconnects has been developed for analyzing the crosstalk induced effects. Further, a temperature-aware gate oxide reliability model has been proposed to compute the crosstalk induced overshoot/undershoot impact on ultra-thin gate oxide for CMOS devices in terms of failure-in-time (FIT) for side-contact (SC) pristine as well as top-contact (TC) Arsenic pentafluoride (AsF <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>5</sub> ), Ferric chloride (FeCl <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> ) and Lithium (Li) intercalation doped and undoped MLGNR interconnects. Subsequently, comparisons with Cu-based interconnects are made over a range of chip operating temperature from 233K to 450K." @default.
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• W2964408090 date "2019-09-01" @default.
• W2964408090 modified "2023-09-30" @default.
• W2964408090 title "Modeling and Analysis of Electro-Thermal Impact of Crosstalk Induced Gate Oxide Reliability in Pristine and Intercalation Doped MLGNR Interconnects" @default.
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• W2964408090 doi "https://doi.org/10.1109/tdmr.2019.2933035" @default.
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