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- W2968987921 abstract "Molybdenum oxide (MoO 3 ) films were deposited on glass, Al, Mo and Si substrates at room temperature in Ar-O 2 plasma by RF magnetron sputtering system. The as-deposited films were annealed in air at 400 ∘ C and 500 ∘ C. X-ray diffraction (XRD) results revealed that films annealed at 400 ∘ C on all the substrates exhibited diffraction peaks of orthorhombic (α) and monoclinic (β) phases of MoO 3 . By increasing the annealing temperature to 500 ∘ C, the [Formula: see text]-MoO 3 phase on glass became more significant when compared with the [Formula: see text]-MoO 3 phase. In contrast, the [Formula: see text]-MoO 3 phase was more prominent in the case of film grown on the Mo substrate. The Fourier transform infrared spectroscopy (FTIR) analysis indicated stretching vibrational modes of Mo[Formula: see text]O and transverse optical modes of Mo-O-Mo on all the substrates. The surface morphology of MoO 3 films on glass shows a flat surface at 400 ∘ C that was changed into a layered-like structure at 500 ∘ C. In the case of MoO 3 films on Al and Si, arbitrary-shaped particles were transformed into needle and rod shapes, respectively, with increase of annealing temperature from 400 ∘ C to 500 ∘ C. The film annealed on Mo substrate at 400 ∘ C revealed corrugated particles that were changed into coarse and elongated particles at 500 ∘ C. The morphological changes in MoO 3 film with increase of annealing temperature were associated with tensile strain developed inside MoO 3 due to lattice and thermal mismatch between the film and the substrate." @default.
- W2968987921 created "2019-08-22" @default.
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- W2968987921 date "2019-09-09" @default.
- W2968987921 modified "2023-10-18" @default.
- W2968987921 title "STRUCTURAL AND MORPHOLOGICAL PROPERTIES OF ANNEALED MoO<sub>3</sub> FILMS ON DIFFERENT SUBSTRATES" @default.
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- W2968987921 doi "https://doi.org/10.1142/s0218625x19501506" @default.
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