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- W2969768322 abstract "This tutorial reviews key issues for use of highly-channeled profiles with MeV energy dopants in Si. Practical issues for systems and process, including beam-wafer alignment, beam divergence and wafer temperature, are discussed as well as the use of Monte-Carlo modeling to guide process development. Recent photo- and cathodo-luminescence results on the effects of elevated wafer implant temperatures on residual defects after annealing in channeled MeV dopant implants are outlined." @default.
- W2969768322 created "2019-08-29" @default.
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- W2969768322 date "2019-06-01" @default.
- W2969768322 modified "2023-09-28" @default.
- W2969768322 title "Aspects of Highly-channeled MeV Implants of Dopants in Si(100)" @default.
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- W2969768322 doi "https://doi.org/10.23919/iwjt.2019.8802900" @default.
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