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• W2971305978 abstract "Oxide semiconductor thin-film transistors (TFTs) are currently used as the fundamental building blocks in commercial flat-panel displays because of the excellent performance of n-channel TFTs. However, except for a few materials, their p-channel performances have not been acceptable. Although some p-type oxide semiconductors exhibit superior hole transport properties, their TFT performances are greatly deteriorated, which is a major obstacle in the development of complementary metal–oxide–semiconductor (CMOS) circuits. Herein, an ionic nitride semiconductor, copper nitride (Cu3N), composed of environmentally benign elements is shown to exhibit highly symmetric hole and electron transport, indicating its suitability for application in CMOS circuits. We performed a two-step investigation. The first step was to examine the ultimate potential of Cu3N using an electric-double-layer transistor structure with epitaxial Cu3N channels measured at 220 K, which exhibited ambipolar operation with hole and electron mobilities of ∼5 and ∼10 cm2 V–1 s–1, respectively, and a high on/off ratio of ∼105. The second step is to demonstrate the feasibility of TFT circuits with a polycrystalline channel on non-single-crystal (SiO2/Si) substrates. CMOS-like inverters composed of two polycrystalline Cu3N ambipolar TFTs on a SiO2/Si substrate exhibited a high voltage gain of ∼100." @default.
• W2971305978 created "2019-09-05" @default.
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• W2971305978 date "2019-08-28" @default.
• W2971305978 modified "2023-10-16" @default.
• W2971305978 title "Symmetric Ambipolar Thin-Film Transistors and High-Gain CMOS-like Inverters Using Environmentally Friendly Copper Nitride" @default.
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• W2971305978 doi "https://doi.org/10.1021/acsami.9b12068" @default.
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• W2971305978 hasPublicationYear "2019" @default.
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