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• W297412411 abstract "Publisher Summary This chapter discusses the techniques used in electron beam test systems. Several specially designed commercial systems are available that utilize these techniques and have the system computer-interfaced with computer-aided design tools, automatic wafer loading and positioning, automatic mechanical probes for supplies, and input/output signals. Several systems of this type have been built over the years during the development phase of the techniques. The limitations of these systems for future work arise from the fact that shorter beam pulses in time, with small spot sizes to probe the future integrated circuits (ICs), give very low average currents, that cause voltage resolution to suffer. The alternative is to employ techniques used in image processing by tolerating wider beam pulses and deconvolution of the waveform. Alternatively, the use of beam bunching to pulse the beam may become more popular or photoelectronic emission pulses may be used. Another use of the electron beam tester is in device restructuring that at present is undergoing further development. It remains to see how popular this technique becomes with time. The chapter discusses some fundamental aspects of techniques used in electron beam testing." @default.
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• W297412411 date "1989-01-01" @default.
• W297412411 modified "2023-09-25" @default.
• W297412411 title "Electron Beam Testing: An Outline of Techniques" @default.
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• W297412411 doi "https://doi.org/10.1016/b978-0-12-234121-2.50014-0" @default.
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