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- W2977771752 abstract "In this paper, we investigated the recrystallization process of Cu films. By annealing at a high temperature of 300°C or above, the grain size of Cu films remarkably increasesd, and the number of grain boundaries decreased. Annealing helped to restructure of the films, causing to improve the electron transfer rate and the resistance of films droped by 15%.So that the thickness of the deposited Cu films can be reduced to achieve the same resistance, the production cost can be saved, and the production efficiency of the PVD machine will be improved." @default.
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- W2977771752 date "2019-09-01" @default.
- W2977771752 modified "2023-10-16" @default.
- W2977771752 title "P‐6.5: A Study about The Effect of Cu Film Recrystallization on Resistivity" @default.
- W2977771752 cites W1990797834 @default.
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- W2977771752 doi "https://doi.org/10.1002/sdtp.13641" @default.
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