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- W2979982526 abstract "Dielectric metasurfaces made from crystalline silicon, titanium dioxide, gallium nitride and silicon nitride have developed rapidly for applications in the visible wavelength regime. High performance metasurfaces typically require the realisation of subwavelength, high aspect ratio nanostructures, the fabrication of which can be challenging. Here, we propose and demonstrate the operation of high performance metasurfaces in ultra-thin (100 nm) crystalline silicon at the wavelength of 532 nm. Using optical beam analysis, we discuss fabrication complexity and show that our approach is more fabrication-tolerant than the nanofin approach, which has so far produced the highest performance metasurfaces, but may be difficult to manufacture, especially when using nanoimprint lithography." @default.
- W2979982526 created "2019-10-18" @default.
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- W2979982526 date "2019-10-10" @default.
- W2979982526 modified "2023-10-17" @default.
- W2979982526 title "Ultra-thin transmissive crystalline silicon high-contrast grating metasurfaces" @default.
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- W2979982526 doi "https://doi.org/10.1364/oe.27.030931" @default.
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