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• W2980679455 abstract "Two-dimensional photonic structures such as nanostructured pillar gratings are useful for various applications including wave coupling, diffractive optics, and security features. Two-photon lithography facilitates the generation of such nanostructured surfaces with high precision and reproducibility. In this work, we report on nanopillar diffraction gratings fabricated by two-photon lithography with various laser powers close to the polymerization threshold of the photoresist. As a result, defect-free arrays of pillars with diameters down to 184 nm were fabricated. The structure sizes were analyzed by scanning electron microscopy and compared to theoretical predictions obtained from Monte Carlo simulations. The optical reflectivities of the nanopillar gratings were analyzed by optical microscopy and verified by rigorous coupled-wave simulations." @default.
• W2980679455 created "2019-10-25" @default.
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• W2980679455 date "2019-10-19" @default.
• W2980679455 modified "2023-10-17" @default.
• W2980679455 title "Nanopillar Diffraction Gratings by Two-Photon Lithography" @default.
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• W2980679455 doi "https://doi.org/10.3390/nano9101495" @default.
• W2980679455 hasPubMedCentralId "https://www.ncbi.nlm.nih.gov/pmc/articles/6836244" @default.
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