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- W2980909299 abstract "A HfO2-based thin film is a nanoscale ferroelectric material with a high-k dielectric and CMOS compatibility, which make it a promising candidate for high-performance electronics. Here, we demonstrate the synthesis of a ferroelectric Y-doped HfO2 (HYO) thin film by pulsed laser deposition. This HYO thin film is gradient doped by alternately depositing a HfO2 ceramic target and a Y2O3 ceramic target. In the films, the orthorhombic phase, ferroelectric phase, is proved by grazing incidence x-ray diffraction and scanning transmission electron microscopy measurements. Moreover, the HYO thin film embraces outstanding ferroelectric and dielectric properties, its remanent polarization is up to 10.5 μC/cm2, and the dielectric constant is 27. The 180° inversion of the domain can be observed in a piezoelectric power microscopy image, while the phase contrast of the write domain fades with time. Therefore, this work provides a reliable approach to obtain a ferroelectric HYO thin film, which enables great potential in future high-performance nanoelectronics." @default.
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- W2980909299 date "2019-10-14" @default.
- W2980909299 modified "2023-10-18" @default.
- W2980909299 title "Ferroelectric properties of gradient doped Y2O3:HfO2 thin films grown by pulsed laser deposition" @default.
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- W2980909299 doi "https://doi.org/10.1063/1.5121858" @default.
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