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- W2980942239 endingPage "226" @default.
- W2980942239 startingPage "204" @default.
- W2980942239 abstract "Atomic layer deposition (ALD) can synthesise materials with atomic-scale precision. The ability to tune the material composition, film thickness with excellent conformality, allow low-temperature processing, and in-situ real-time monitoring makes this technique very appealing for a wide range of applications. In this review, we focus on the application of ALD layers in a wide range of solar cells. We focus on industrial silicon, thin film, organic and quantum dot solar cells. It is shown that the merits of ALD have already been exploited in a wide range of solar cells at the lab scale and that ALD is already applied in high-volume manufacturing of silicon solar cells." @default.
- W2980942239 created "2019-10-25" @default.
- W2980942239 creator A5018208988 @default.
- W2980942239 creator A5018396855 @default.
- W2980942239 creator A5033510051 @default.
- W2980942239 creator A5047590950 @default.
- W2980942239 creator A5074513982 @default.
- W2980942239 creator A5082502942 @default.
- W2980942239 creator A5083096899 @default.
- W2980942239 creator A5088944302 @default.
- W2980942239 date "2020-09-01" @default.
- W2980942239 modified "2023-10-14" @default.
- W2980942239 title "Atomic layer deposition enabling higher efficiency solar cells: A review" @default.
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