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- W2986996840 abstract "We report a method for fabricating sub-0.1-pm gates using conventional optical contact lithography, exploiting self-limiting notch formation in conformal PECVD oxide between ohmic contacts, and the limited lateral etch of oxide by FIE. The resulting gate openings in the oxide are very narrow (=700 A), and quite uniform (U < 0.23. 154 GHz current gain cutoff frequency has been extrapolated for a pseudomorphic InGaAs-channel E-MODFET made in this way. Functioning prescalers have been fabricated and characterized on-wafer." @default.
- W2986996840 created "2019-11-22" @default.
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- W2986996840 date "1992-01-01" @default.
- W2986996840 modified "2023-09-26" @default.
- W2986996840 title "A 150 GHz Sub-O.l-pi E/D MODFET MSI Process" @default.
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