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• W2993694927 abstract "Two valuable tools for the thermal characterization of thin films are Time Domain Thermoreflectance (TDTR) and Scanning Thermal Microscopy (SThM). TDTR is capable of delivering temperature dependent thermal properties by comparing measured TDTR data to different models of heat transport. In this work different models are applied on a 500 nm thin, CVD grown W-layer on TiN coated Si. SThM is a complementary technique where the thermal conductivity (λ) gets directly measured in a quantitative way using the 3ω method. TDTR and SThM show that room temperature W-samples are altered by heat treatment under argon atmosphere: On the as deposited W-layer, λ is about 154 W/mK. After a short heat treatment (2.5 minutes at 425°C), λ decreases to about 147 W/mK, while along heat treatment (4 cycles of ~18 minutes at 425°C) increases λ to ~155 W/mK." @default.
• W2993694927 created "2019-12-13" @default.
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• W2993694927 date "2019-09-01" @default.
• W2993694927 modified "2023-09-26" @default.
• W2993694927 title "Investigation on Thermo-Physical Properties of 500 nm CVD Grown Tungsten Layers using Time Domain Thermoreflectance and Scanning Thermal Microscopy" @default.
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• W2993694927 doi "https://doi.org/10.1109/therminic.2019.8923439" @default.
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