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• W2994836466 abstract "By saturating a photochromic transition with a nodal illumination (wavelength, $ensuremath{lambda}$), one isomeric form of a small molecule is spatially localized to a region smaller than the far-field diffraction limit. A selective oxidation step effectively locks this pattern allowing repeated patterning. Using this approach and a two-beam interferometer, we demonstrate isolated lines as narrow as $ensuremath{lambda}/8$ (78 nm) and spacing between features as narrow as $ensuremath{lambda}/4$ (153 nm). This is considerably smaller than the minimum far-field diffraction limit of $ensuremath{lambda}/2$. Most significantly, nanopatterning is achieved via single-photon reactions and at low light levels, which in turn allow for high throughput." @default.
• W2994836466 created "2019-12-26" @default.
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• W2994836466 date "2011-11-07" @default.
• W2994836466 modified "2023-10-06" @default.
• W2994836466 title "Breaking the Far-Field Diffraction Limit in Optical Nanopatterning via Repeated Photochemical and Electrochemical Transitions in Photochromic Molecules" @default.
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• W2994836466 doi "https://doi.org/10.1103/physrevlett.107.205501" @default.
• W2994836466 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/22181742" @default.
• W2994836466 hasPublicationYear "2011" @default.
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