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- W2999355082 abstract "In this paper, the response of low-frequency noise under and after the X-ray irradiation for amorphous indium–gallium–zinc-oxide (a-IGZO) thin film transistors (TFTs) is analyzed. With fixed irradiation dose, the noise stays the same regardless of the TFT under and after X-ray irradiation. The noise mechanism is analyzed to be mainly the carrier mobility fluctuation. The coincidence of the noise of TFTs under and after X-ray irradiation further confirms that there is no direct relation between X-ray irradiation and the noise behavior. The mechanism of the positive charge trapping in the oxide layer under X-ray for the threshold voltage (Vth) shift of the TFT does not affect its noise behavior. With more stable and larger SNR by 20 dB than low-temperature polycrystalline-silicon (LTPS) TFT, a-IGZO TFT is believed to be a more suitable device for applying to X-ray active pixel sensing circuits." @default.
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- W2999355082 date "2020-01-17" @default.
- W2999355082 modified "2023-10-09" @default.
- W2999355082 title "Effects of X-ray Irradiation on the Noise Behavior of Amorphous Indium-Gallium-Zinc-Oxide TFTs" @default.
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- W2999355082 doi "https://doi.org/10.1149/1945-7111/ab6823" @default.
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