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- W2999693091 abstract "The gate-all-around (GAA) silicon nanosheet (SiNS) metal-oxide-semiconductor field-effect transistor (MOSFET) structures have been recognized as excellent candidates to achieve improved power performance and area scaling compared to the current FinFET technologies. Specifically, SiNS structures provide high drive currents due to wide effective channel width (Weff) while maintaining short-channel control. In this paper, we fabricate a GAA SiNS MOSFET fully surrounded by a gate with a gate length (LG) of 22 nm, a SiNS width (WNS) of 23 nm, and SiNS thickness (TNS) of 6 nm. In addition, the fabricated GAA SiNS MOSFETs were evaluated for electrostatic characteristics and short-channel effects (SCEs) according to various channel length and width dimensions. We confirmed that the GAA SiNS MOSFET showed similar short-channel controllability regardless of WNS due to the extremely thin TNS. In addition, we analyzed SCEs of GAA SiNS MOSFETs with different TNS through simulation." @default.
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- W2999693091 date "2020-02-11" @default.
- W2999693091 modified "2023-10-18" @default.
- W2999693091 title "Design study of the gate-all-around silicon nanosheet MOSFETs" @default.
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- W2999693091 doi "https://doi.org/10.1088/1361-6641/ab6bab" @default.
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