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• W3002782954 endingPage "024009" @default.
• W3002782954 startingPage "024009" @default.
• W3002782954 abstract "Due to the broad application prospects of optoelectronic devices and microwave devices at high temperature and power, the process of Metal Organic Chemical Vapor Deposition (MOCVD) of AlGaN of the key material AlGaN has been extensively researched in the past 30 years. In order to enhance the quality of AlGaN layers, researchers continuously analyzed their growth mechanism and optimized the growth process through experimental and theoretical studies. In this work, based on reviewing previous studies, we summarize the research progress for AlGaN grown by MOCVD and discuss the existing problems and future research priorities." @default.
• W3002782954 created "2020-01-30" @default.
• W3002782954 creator A5005766295 @default.
• W3002782954 creator A5015317038 @default.
• W3002782954 creator A5018257409 @default.
• W3002782954 creator A5033585106 @default.
• W3002782954 date "2020-01-22" @default.
• W3002782954 modified "2023-09-27" @default.
• W3002782954 title "Review—Review of Research on AlGaN MOCVD Growth" @default.
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