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- W3004421872 abstract "As the technology node shrinks, the choice of laser for performing fault isolation becomes critical. The conventionally used 1319nm laser has spatial resolution constraint at smaller geometries. The 1064nm laser provides resolution improvement at the cost of reduced signal strength especially for thicker or heavily doped substrates. This paper explores the possibilities of using a low noise 1122nm laser in Electrical Fault isolation analyses." @default.
- W3004421872 created "2020-02-14" @default.
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- W3004421872 date "2019-07-01" @default.
- W3004421872 modified "2023-09-23" @default.
- W3004421872 title "Characterization of 1122nm Laser for Laser Based Fault Isolation Applications" @default.
- W3004421872 doi "https://doi.org/10.1109/ipfa47161.2019.8984804" @default.
- W3004421872 hasPublicationYear "2019" @default.
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