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- W3008671144 abstract "In this study, we developed a surface modification process for silica microreactor array chips to enable a rapid and easy-to-use dispensation of aqueous solutions into their microwells. The etch-back method was adopted to perform the site-selective surface modification of a silica substrate with microwells (1 × 106 wells cm−2, 50 fL/well); this technique maintains the hydrophilicity of the microwell inner walls and simultaneously introduces hydrophobicity onto the surface outside the microwells. The effectiveness of the modification was experimentally assessed by the successful isolation of an aqueous solution in the individual microreactors. This technique could be applied for the fabrication of microreactor array chips used in those fields requiring high-speed multiplex analysis of biomolecules, such as drug discovery and medical diagnosis." @default.
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- W3008671144 date "2020-03-16" @default.
- W3008671144 modified "2023-10-02" @default.
- W3008671144 title "A surface modification process for silica microreactor array chips to seal aqueous solutions" @default.
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- W3008671144 doi "https://doi.org/10.35848/1347-4065/ab7adf" @default.
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