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- W3021374882 abstract "A simple mathematical model is proposed to account for experimental behaviour of a negative commercial photoresist: Microresist 747 of Kodak. Influence of variation of the three parameters caracterizing the resist can be roughly predicted refering to the computed theoretical curves presented. An estimated value for the overall coefficient involving quantum efficiency and kinetics of reaction is found. Brief discussion of basic hypothesis involved is presented, and attention is called for the fact that the whole of the reaction mechanism and not only the photoabsorption process must be considered in order to find basic equations governing the phenomenon. Experimental and theoretical results are presented." @default.
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- W3021374882 date "1977-01-01" @default.
- W3021374882 modified "2023-09-26" @default.
- W3021374882 title "A SIMPLE MATHEMATICAL MODEL FOR NEGATIVE PHOTORESIST BEHAVIOUR" @default.
- W3021374882 cites W1991971235 @default.
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- W3021374882 doi "https://doi.org/10.1016/b978-0-08-021625-6.50045-2" @default.
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