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• W3023471887 abstract "We used the mechanically controllable break-junction technique to study the consecutive stages of interaction of hydrogen molecules with surfaces of W, Mo, and Ta at 4.2--6 K. This includes the physical adsorption of ${text{H}}_{2}$ molecules, their subsequent chemisorption, their dissociation, and the diffusion of protons into the bulk of the materials. The quantum diffusion is accompanied by $1/{f}^{ensuremath{alpha}}$ contact resistance noise. For tantalum hydride ${text{TaH}}_{x}$, we found a 10% increase of the critical temperature ${T}_{c}$ with respect to pure Ta." @default.
• W3023471887 created "2020-05-13" @default.
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• W3023471887 date "2008-04-18" @default.
• W3023471887 modified "2023-09-27" @default.
• W3023471887 title "Low-temperature dissociative adsorption of H on W, Mo, and Ta surfaces studied with mechanically controllable break-junctions" @default.
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• W3023471887 doi "https://doi.org/10.1103/physrevb.77.165423" @default.
• W3023471887 hasPublicationYear "2008" @default.
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