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• W3024584505 abstract "Amorphous Ga2O3:CdO thin films and their thin-film transistor (TFT) photodetectors were fabricated via a simple and low-cost spin-coating method. The film optical bandgap and TFT electrical parameters can be effectively regulated via changing the Cd content. The optimized Ga2O3:CdO TFT photodetector exhibited a responsivity of 2.17 A/W and a high UV/vis. rejection of 1.88 × 104 under 260 nm at small working biases, which are comparable or even superior to the recently reported results. Systematic comparison between metal-semiconductor-metal- and TFT-type photodetectors further confirmed that our TFT photodetectors had superior detective performance and lower electrical power consumption." @default.
• W3024584505 created "2020-05-21" @default.
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• W3024584505 date "2020-05-11" @default.
• W3024584505 modified "2023-10-14" @default.
• W3024584505 title "Solution-processed amorphous Ga2O3:CdO TFT-type deep-UV photodetectors" @default.
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• W3024584505 doi "https://doi.org/10.1063/5.0007617" @default.
• W3024584505 hasPublicationYear "2020" @default.
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