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• W3028543339 endingPage "138115" @default.
• W3028543339 startingPage "138115" @default.
• W3028543339 abstract "We have grown nanocolumnar titanium oxide thin films on glass substrates for heat mirror applications using direct-current magnetron sputtering methods. By varying the plasma power from 100 to 200 W in the film growth, we have controlled the population and energy of plasma species, mainly titanium, in order to regulate the crystal properties and geometric structures. The titanium sesquioxide phase has developed, along with suppression of the dioxide phase, and the lateral/longitudinal dimension of the nanocolumns was enlarged by elevated plasma power. The best performance in terms of infrared reflectance, ~ 60 % at 2300 nm, was observed from the films grown at the highest plasma power. Furthermore, the dependence on the plasma power of the heat mirror characteristics with reference to the aspect of surface plasmon resonance phenomena was investigated." @default.
• W3028543339 created "2020-05-29" @default.
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• W3028543339 date "2020-08-01" @default.
• W3028543339 modified "2023-09-27" @default.
• W3028543339 title "Effect of direct-current sputtering plasma power on growth of nanocolumnar titanium oxide heat mirrors" @default.
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• W3028543339 doi "https://doi.org/10.1016/j.tsf.2020.138115" @default.
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