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- W3033997722 abstract "Vacuum ultraviolet-absorption spectroscopy (AS) and emission spectroscopy (ES) from delocalized probe plasma are implemented in the downstream chamber of a soft-etch industrial plasma reactor. A capacitively coupled plasma plasma, running in the upper compartment in He/NF3/NH3/H2 mixtures at about 1 Torr, produces reactive species which flow through a shower head into a downstream chamber, where they can etch different μ-electronic materials: Si, SiO2, SiN, etc. The ES reveals the presence of F atoms, while the dissociation rates of NF3 and NH3 are deduced from the AS, as well as the density of HF molecules, produced by chemical chain-reactions between dissociation products of NF3, NH3, and H2. The variations of HF density as a function of the NH3 flow rate suggest the possible formation of NH4F molecules in the plasma." @default.
- W3033997722 created "2020-06-12" @default.
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- W3033997722 date "2020-06-04" @default.
- W3033997722 modified "2023-10-04" @default.
- W3033997722 title "Vacuum ultraviolet-absorption spectroscopy and delocalized plasma-induced emission used for the species detection in a down-stream soft-etch plasma reactor" @default.
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- W3033997722 doi "https://doi.org/10.1116/6.0000134" @default.
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