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• W3036205612 abstract "Insertion of partial monolayers of oxygen during silicon epitaxy (OI) has been shown experimentally and by simulation to facilitate the blocking interstitials during oxidation and thus to enable precision engineering of dopant profiles. This invited paper describes examples of recent OI advances, including the engineering of improved 5V NMOS power devices and RF-SOI switches." @default.
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• W3036205612 date "2020-04-01" @default.
• W3036205612 modified "2023-09-26" @default.
• W3036205612 title "Applications of Oxygen Inserted Silicon Devices in Power and RF: (invited)" @default.
• W3036205612 cites W1996005714 @default.
• W3036205612 cites W2123183335 @default.
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• W3036205612 doi "https://doi.org/10.1109/edtm47692.2020.9117944" @default.
• W3036205612 hasPublicationYear "2020" @default.
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