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- W3036295557 abstract "Interfacial reactions between epitactic nickel oxide thin films and single-crystal aluminum oxide substrates were investigated as a function of substrate orientation. Two thin-film reaction geometries were employed for this purpose. The first, which was used to study the nucleation of the reaction product, consisted of epitactic nickel oxide thin films on alumina substrates. The second, which was used to determine the reaction kinetics, was similar to the first except that a thin epitactic buffer layer of the reaction product was placed between the nickel oxide film and substrate. In this case, the nucleation was avoided by essentially ‘nucleating’ the reaction product artificially. As thin films were utilized, and the scale of the salient microstructural features were correspondingly small, electron microscopy techniques were applied to determine the preferred nucleation sites and measure the rate at which the reaction proceeds for the respective geometries. Both types of thin-film reaction-couple geometry were produced by pulsed-laser deposition (PLD). PLD is a versatile thin-film deposition technique capable of producing high-quality oxide epilayers. The setup for PLD has been described elsewhere." @default.
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- W3036295557 date "1995-08-13" @default.
- W3036295557 modified "2023-09-26" @default.
- W3036295557 title "Ceramic thin-film reactions: phase boundaries and kinetics" @default.
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- W3036295557 doi "https://doi.org/10.1017/s0424820100138063" @default.
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