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- W3036320529 abstract "Thin-film reactions in ceramic systems are of increasing importance as materials such as oxide superconductors and ferroelectrics are applied in thin-film form. In fact, reactions have been found to occur during the growth of YBa 2 Cu 3 O 6+x on ZrO 2 . Additionally, thin-film reactions have also been intentionally initiated for the production of buffer layers for the subsequent growth of high-T c superconductor thin films. The problem is that the kinetics of ceramic thin-film reactions are not well understood when the reaction layer is very thin; that is, when the rate-limiting step is a phase-boundary reaction as opposed to diffusion of the reactants through the product layer. In this case, the reaction layer is likely to be laterally non-uniform. In the present study, the measurement of thin reaction-product layers is accomplished by first digitally acquiring backscattered-electron images in a high-resolution field-emission scanning electron microscope (FESEM) followed by image analysis. Furthermore, the problem of measuring such small thicknesses (e.g., 20-500nm) over lengths of interfaces longer than 3mm is addressed." @default.
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- W3036320529 date "1995-08-13" @default.
- W3036320529 modified "2023-09-26" @default.
- W3036320529 title "The measurement of thin-film reaction layers with high-resolution FESEM" @default.
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- W3036320529 doi "https://doi.org/10.1017/s0424820100138026" @default.
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