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- W3036779712 abstract "Thickness measurements of thin films are performed by both energy-dispersive x-ray spectroscopy (EDS) and x-ray fluorescence (XRF). XRF can measure thicker films than EDS, and XRF measurements also have somewhat greater precision than EDS measurements. However, small components with curved or irregular shapes that are used for various applications in the the Inertial Confinement Fusion program at LLNL present geometrical problems that are not conducive to XRF analyses but may have only a minimal effect on EDS analyses. This work describes the development of an EDS technique to measure the thickness of electroless nickel deposits on gold substrates. Although elaborate correction techniques have been developed for thin-film measurements by x-ray analysis, the thickness of electroless nickel films can be dependent on the plating bath used. Therefore, standard calibration curves were established by correlating EDS data with thickness measurements that were obtained by contact profilometry." @default.
- W3036779712 created "2020-06-25" @default.
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- W3036779712 date "1991-08-01" @default.
- W3036779712 modified "2023-09-27" @default.
- W3036779712 title "Analysis of electroless nickel thin films" @default.
- W3036779712 cites W2155740983 @default.
- W3036779712 doi "https://doi.org/10.1017/s0424820100086854" @default.
- W3036779712 hasPublicationYear "1991" @default.
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