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- W3036849885 abstract "Thermal oxidation of silicon containing surface defects results in the formation of extrinsic stacking faults inhabiting the (111) planes. The faults are bound by Frank partial dislocations, and oxygen may be closely associated with them. The present work aims to explore the fault core structure by lattice imaging. The p-type, 4 Ω-cm Si was boron implanted (50kV, 1x10 15 /cm 2 ), annealed for 30 min at 1000°C and steam oxidized for 2 hours at 1050°C. The boron implantation prior to oxidation serves to produce a high density of stacking faults to facilitate their observation. The polished and thinned (011) foils were examined at 125kV in a Siemens 102 EM with a goniometer stage at magnifications of 500 000 to 800 000x, using axial illumination and no objective aperture." @default.
- W3036849885 created "2020-06-25" @default.
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- W3036849885 date "1977-01-01" @default.
- W3036849885 modified "2023-09-24" @default.
- W3036849885 title "Lattice Imaging of Stacking Faults in (011) Silicon" @default.
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- W3036849885 doi "https://doi.org/10.1017/s0424820100077748" @default.
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