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- W3040476505 abstract "There is much current interest in the magnetotransport properties of systems consisting of two (or more) magnetic metal layers separated by thin insulating layers. Traditional magnetic tunnel junctions (MTJs) are comprised of simple ferromagnet-insulator-ferromagnet trilayer structures and the conductance depends on the relative alignments of the magnetizations in the two ferromagnets. In the case of discontinuous metal/insulator multilayers, negative magnetoresistance (MR) results from spindependent tunneling. In both types of systems, the tunneling phenomena are strongly influenced by the microstructure of the films, particularly the metal/insulator interfaces and the nature and uniformity of the thin oxide barrier layers. In this study, we have used cross-sectional HREM to characterize a variety of magnetic tunnel junctions and discontinuous multilayers. The MTJs were prepared by rf and dc magnetron sputtering onto thermally oxidized (100) silicon wafers at room temperature. The magnetic layers consisted of thin films of Co, Fe and/or CoFe alloys with thicknesses ∼ 30-50nm, and the barriers included MgO, HfO 2 , CoO, SiO 2 as well as Al 2 O 3 (thicknesses in the range 2-10nm)." @default.
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- W3040476505 date "1998-07-01" @default.
- W3040476505 modified "2023-09-27" @default.
- W3040476505 title "Hrem Characterization of Magnetic Tunnel Junctions and Discontinuous Multilayers" @default.
- W3040476505 cites W1996418689 @default.
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- W3040476505 doi "https://doi.org/10.1017/s1431927600024119" @default.
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