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• W3043022959 abstract "Abstract We demonstrate a method for characterizing the field-dependent aberrations of a full-field synchrotron-based extreme ultraviolet microscope. The statistical uniformity of the inherent, atomic-scale roughness of readily-available photomask blanks enables a self-calibrating computational procedure using images acquired under standard operation. We characterize the aberrations across a 30-um field-of-view, demonstrating a minimum aberration magnitude of smaller than $$lambda /21 , {hbox {rms}}$$ <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML><mml:mrow><mml:mi>λ</mml:mi><mml:mo>/</mml:mo><mml:mn>21</mml:mn><mml:mspace /><mml:mtext>rms</mml:mtext></mml:mrow></mml:math> averaged over the center 5-um area, with a measurement accuracy better than $$lambda /180 , {hbox {rms}}$$ <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML><mml:mrow><mml:mi>λ</mml:mi><mml:mo>/</mml:mo><mml:mn>180</mml:mn><mml:mspace /><mml:mtext>rms</mml:mtext></mml:mrow></mml:math> . The measured field variation of aberrations is consistent with system geometry and agrees with prior characterizations of the same system. In certain cases, it may be possible to additionally recover the illumination wavefront from the same images. Our method is general and is easily applied to coherent imaging systems with steerable illumination without requiring invasive hardware or custom test objects; hence, it provides substantial benefits when characterizing microscopes and high-resolution imaging systems in situ." @default.
• W3043022959 created "2020-07-23" @default.
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• W3043022959 date "2020-07-15" @default.
• W3043022959 modified "2023-10-14" @default.
• W3043022959 title "Extreme ultraviolet microscope characterization using photomask surface roughness" @default.
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• W3043022959 doi "https://doi.org/10.1038/s41598-020-68588-w" @default.
• W3043022959 hasPubMedCentralId "https://www.ncbi.nlm.nih.gov/pmc/articles/7363931" @default.
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