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- W3048505377 endingPage "095015" @default.
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- W3048505377 abstract "Abstract Detailed knowledge of correlations between direct current (DC) cathodic arc deposition process parameters, plasma properties, and the microstructure of deposited coatings are essential for a comprehensive understanding of the DC cathodic arc deposition process. In this study we have probed the plasma, generated by DC arc on a Ti-50 at.% Al cathode in a N 2 ambience, at the growth front of the TiAlN coating. Several consequences of an increasing N 2 pressure are observed, including a decreased electron temperature, an increased electron density, and a loss of energetic ions. As a result, the preferred growth texture switches from 220 to 111. It is also observed that neutrals in the plasma can significantly contribute to the growth of TiAlN coatings." @default.
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- W3048505377 date "2020-09-01" @default.
- W3048505377 modified "2023-09-27" @default.
- W3048505377 title "Effect of varying N<sub>2</sub> pressure on DC arc plasma properties and microstructure of TiAlN coatings" @default.
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- W3048505377 doi "https://doi.org/10.1088/1361-6595/abaeb4" @default.
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