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- W3048651010 abstract "Microposit S1813 is very popular photoresist due to high resolution, simplicity of deposition methods, and high adhesion to semiconductors. The least controlled parameter of photoresist thin films deposition is the tanning process, where everything depends on the operator and therefore it is quite difficult to ensure perfect reproducibility of the process. In this work, we studied thin films of Microposit S1813, deposited by spin coating on silicon substrates, and then tanned in 30, 45, 60, 75, and 90 s at 110 (^circ )C. The thickness of the films was studied using optical microscopy. The waviness and surface roughness were investigated by atomic force microscopy. To evaluate the mechanical properties of Microposit S1813 thin films, the nanoindentation method in the quasistatic mode was used. The results obtained will help to determine the region of the indenter-sample contact area as well as the measurement error, which is necessary for modern analytical mathematical models used to study the mechanical characteristics of multilayer coatings." @default.
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- W3048651010 date "2020-01-01" @default.
- W3048651010 modified "2023-09-28" @default.
- W3048651010 title "Mechanical Properties of Microposit S1813 Thin Layers" @default.
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- W3048651010 doi "https://doi.org/10.1007/978-3-030-48161-2_9" @default.
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