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- W306136907 abstract "Microwave plasma-enhanced chemical vapor deposition of diamond films on silicon carbide and tungsten carbide (with 6% cobalt) surfaces using fluorocarbon gases has been demonstrated. The diamond films are characterized by scanning electron microscopy and Raman spectroscopy. The proposed nucleation and growth mechanism involves concurrent etching of the non-carbon component by atomic fluorine and deposition of diamond. Optical emission spectroscopy is used to corroborate this growth mechanism." @default.
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- W306136907 date "1994-01-01" @default.
- W306136907 modified "2023-09-23" @default.
- W306136907 title "Diamond Nucleation by a Selective Etching Technique" @default.
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- W306136907 doi "https://doi.org/10.1016/b978-1-4832-8382-1.50151-8" @default.
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